Concepedia

Defectivity Control

Defectivity Control is a methodological framework within mask fabrication that systematically identifies, monitors, and mitigates defect formation during photomask manufacturing to ensure pattern fidelity and process yield.

50

Publications

1.4K

Citations

347

Authors

80

Institutions

Publications per year

2017–2026

10

Variants

Mask Defect Control

Parents

Publications

50

Composite Polymer Core–Ceria Shell Abrasive Particles during Oxide CMP: A Defectivity Study

Silvia Armini, Joke De Messemaeker, Caroline M. Whelan et al. · Journal of The Electrochemical Society · 2008 · 101 citations

, , +17

Local Defectivity Control of 2D Self‐Assembled Block Copolymer Patterns

Ricardo Ruiz, N. Ruiz, Yifan Zhang et al. · Advanced Materials · 2007 · 94 citations

, , +15

Nanoimprint lithography for semiconductor devices and future patterning innovation

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations · Full text

, , +10

Composite Polymer-Core Silica-Shell Abrasive Particles during Oxide CMP

Silvia Armini, Caroline M. Whelan, Karen Maex et al. · Journal of The Electrochemical Society · 2007 · 57 citations · Full text

, , +16

Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications

Yuansheng Ma, J. Andres Torres, Germain Fenger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 52 citations

, , +13

1–5 of 50

Authors

347

  1. RG
    Roel Gronheid

    IMEC, Belgium

    9 publications · 242 citations

    9

    h-index

  2. DV
    Dieter Van den Heuvel

    IMEC, Belgium

    6 publications · 143 citations

    6

    h-index

  3. KN
    Kathleen Nafus

    IMEC, Belgium

    5 publications · 135 citations

    5

    h-index

  4. PF
    Paul F. Nealey

    University of Wisconsin–Madison, United States

    5 publications · 176 citations

    5

    h-index

  5. BT
    Boon Teik Chan

    IMEC, Belgium

    4 publications · 115 citations

    4

    h-index

1–5 of 347

Institutions

80

  1. IMEC

    Leuven, Belgium

    13 h-index

    79 publications

    2.2K citations

  2. IBM (United States)

    Armonk, United States

    6 h-index

    54 publications

    1.5K citations

  3. Intel (United States)

    Santa Clara, United States

    6 h-index

    6 publications

    259 citations

  4. KU Leuven

    Leuven, Belgium

    6 h-index

    10 publications

    519 citations

  5. Commissariat à l'Énergie Atomique et aux Énergies Alternatives

    Paris, France

    5 h-index

    30 publications

    616 citations

  6. Laboratoire d'Électronique des Technologies de l'Information

    Grenoble, France

    5 h-index

    30 publications

    616 citations

  7. Institut polytechnique de Grenoble

    Grenoble, France

    5 h-index

    17 publications

    414 citations

  8. KLA (United States)

    Milpitas, United States

    5 h-index

    12 publications

    345 citations

1–8 of 80

Venues

  1. 14

    h-index

  2. Journal of The Electrochemical Society

    JES · 3 publications · 198 citations

    3

    h-index

  3. 2

    h-index

  4. IEEE Transactions on Magnetics

    1 publications · 11 citations

    1

    h-index

  5. ACS Applied Materials & Interfaces

    1 publications · 48 citations

    1

    h-index

1–5