Tetsuro Nakasugi

Nanoimprint lithography for semiconductor devices and future patterning innovation

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations · Full text

Engineering, Manufacturing Engineering, Materials Science +10

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 47 citations

Engineering, Computer Engineering, Electrical Engineering +13

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Satō, Ryoichi Inanami et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 20 citations

Engineering, Electrical Engineering, Physics +13

Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Ryoichi Inanami, Shunko Magoshi, Shouhei Kousai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 18 citations

Engineering, Computer Engineering, Electrical Engineering +11

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 15 citations

Engineering, Manufacturing Engineering, Materials Science +12