Tatsuhiko Higashiki

Nanoimprint lithography and future patterning for semiconductor devices

Tatsuhiko Higashiki · Journal of Micro/Nanolithography MEMS and MOEMS · 2011 · 68 citations

High Resolution, Engineering, Electron-beam Lithography +19

Nanoimprint lithography for semiconductor devices and future patterning innovation

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations · Full text

Engineering, Electron-beam Lithography, Pattern Transfer +18

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 47 citations

Engineering, Electron-beam Lithography, Node Cmos Devices +20

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Satō, Ryoichi Inanami et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 20 citations

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 15 citations

Engineering, Mechanical Engineering, Pattern Transfer +18