Statistics
Publications
6
Citations
605
H-Index
6
Active since
2002
Affiliations
Y. Li is an author at IBM (United States) specializing in microelectronics, engineering, and semiconductor devices.
Publications per year
2002–2020
6
6
Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing
Haining Yang, R. Malik, Y. Li et al. · 2005 · 142 citations
Engineering, Electrical Engineering, Manufacturing Engineering +11
A high performance 90nm SOI technology with 0.992 μm/sup 2/ 6T-SRAM cell
Mukesh Khare, S.H. Ku, R. A. Donaton et al. · 2003 · 43 citations
Engineering, Computer Engineering, Electrical Engineering +17
High performance bulk planar 20nm CMOS technology for low power mobile applications
Huiling Shang, S. Jain, E. Josse et al. · 2012 · 26 citations
Engineering, Computer Engineering, Electrical Engineering +17
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