Maurits van der Schaar

Novel diffraction-based spectroscopic method for overlay metrology

Weidong Yang, R. Lowe-Webb, Silvio Rabello et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 47 citations

Engineering, Manufacturing Engineering, Materials Science +16

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Henk-Jan H. Smilde, Arie den Boef, Michael Kubis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 33 citations

Engineering, Manufacturing Engineering, Materials Characterization +16

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Kaustuve Bhattacharyya, Chih-Ming Ke, Guo-Tsai Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Engineering, Electrical Engineering, Metrology +11

Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Kai-Hsiung Chen, G. T. Huang, KS Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 21 citations

Engineering, Electrical Engineering, Materials Science +15

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Chih-Ming Ke, Jimmy Hu, Willie Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 17 citations

Engineering, Manufacturing Engineering, Instrumentation +14