R. Wise

Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing

P.R. Chidambaram, C. Bowen, S. Chakravarthi et al. · IEEE Transactions on Electron Devices · 2006 · 191 citations

Engineering, Severe Plastic Deformation, Mechanical Engineering +24

Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing

Haining Yang, R. Malik, Y. Li et al. · 2005 · 142 citations

Electrical Engineering, Physical Design (Electronics), Engineering +13

Improvement of FinFET Electrical Characteristics by Hydrogen Annealing

Wei Xiong, G. Gebara, Jannat Ara Zaman et al. · IEEE Electron Device Letters · 2004 · 87 citations

Electrical Engineering, Engineering, Hydrogen Annealing +10

TCAD Simulation of Hot-Carrier and Thermal Degradation in STI-LDMOS Transistors

Susanna Reggiani, Gaetano Barone, Stefano Poli et al. · IEEE Transactions on Electron Devices · 2012 · 83 citations

Engineering, Stress Biases, Power Electronics +17

The rise and rise of the B2B brand

R. Wise, Jana Zednickova · Journal of Business Strategy · 2009 · 46 citations

Brand Management Disciplines, Brand Strategy, Strong Brand Management +19