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Publication | Closed Access

The role of physisorption in the cryogenic etching process of silicon

DOI

21

Citations

27

References

2019

Year

Gaëlle Antoun, Rémi Dussart, Thomas Tillocher, Philippe Lefaucheux, Christophe Cardinaud, Aurélie Girard, Seiichi Tahara, Katsumi Yamazaki, Koichi Yatsuda, Jacques Faguet,
Japanese Journal of Applied Physics

Abstract

International audience

References

YearCitations

Page 1