Concepedia

Thomas Tillocher

TT

Statistics

Publications

37

Citations

1.4K

H-Index

23

Active since

2003

Affiliations

Groupe de Recherches sur l'Energétique des Milieux Ionisés(Current)

Centre National de la Recherche Scientifique

Université d'Orléans

STMicroelectronics (France)

The University of Texas at Dallas

Thomas Tillocher is an author at Groupe de Recherches sur l'Energétique des Milieux Ionisés specializing in materials science, materials engineering, and natural sciences.

ORCID

Publications per year

2003–2025

37

Publications

37

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

Rémi Dussart, Thomas Tillocher, Philippe Lefaucheux et al. · Journal of Physics D Applied Physics · 2014 · 266 citations

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Passivation mechanisms in cryogenic SF<sub>6</sub>/O<sub>2</sub>etching process

Rémi Dussart, Mohamed Boufnichel, G. Marcos et al. · Journal of Micromechanics and Microengineering · 2003 · 106 citations

, , +17

Si O x F y passivation layer in silicon cryoetching

X. Mellhaoui, Rémi Dussart, Thomas Tillocher et al. · Journal of Applied Physics · 2005 · 97 citations

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Silicon columnar microstructures induced by an SF<sub>6</sub>/O<sub>2</sub>plasma

Rémi Dussart, X. Mellhaoui, Thomas Tillocher et al. · Journal of Physics D Applied Physics · 2005 · 89 citations

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Boron acceptor concentration in diamond from excitonic recombination intensities

Julien Barjon, Thomas Tillocher, Nada Habka et al. · Physical Review B · 2011 · 50 citations

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