Gaëlle Antoun - Concepedia

Author

Gaëlle Antoun

Also Known As

Antoun, Gaelle, Antoun, Gaëlle, Antoun, Gaëlle, G. Antoun, Gaelle Antoun, Gaëlle Antoun

Publications

148

Citations

H-Index

Concepts

All Affiliations

Gaëlle Antoun is an author at Université d'Orléans specializing in applied physics, microfabrication, and materials science.

#	Concept	H-Index	Publications	Citations
1	Engineering	2	2	53
2	Applied Physics	2	2	53
3	Materials Science	2	2	53
4	Chemical Engineering	1	1	34
5	Integrated Circuits	1	1	19

Gaëlle Antoun

Publications

148

Citations

H-Index

Page 1

	Year	Citations
Cryo atomic layer etching of SiO2 by C4F8 physisorption followed by Ar plasma Gaëlle Antoun, Philippe Lefaucheux, Thomas Tillocher, Applied Physics Letters EngineeringAtomic Layer EtchingVacuum DeviceC4f8 PhysisorptionSilicon On Insulator	2019	34
Mechanism understanding in cryo atomic layer etching of SiO2 based upon C4F8 physisorption Gaëlle Antoun, Thomas Tillocher, Philippe Lefaucheux, Scientific Reports	2021	32
The role of physisorption in the cryogenic etching process of silicon Gaëlle Antoun, Rémi Dussart, Thomas Tillocher, Japanese Journal of Applied Physics	2019	21
Cryogenic etching of silicon compounds using a CHF3 based plasma Rémi Dussart, Rim Ettouri, J. Nos, Journal of Applied Physics Materials ScienceSi3n4 MaterialsEngineeringMicrofabricationSurface Science	2023	19
Quasi <i>In Situ</i> XPS on a SiO <sub>x</sub> F <sub>y</sub> Layer Deposited on Silicon by a Cryogenic Process Gaëlle Antoun, Aurélie Girard, Thomas Tillocher, ECS Journal of Solid State Science and Technology	2022	16
Comparison between Bosch and STiGer Processes for Deep Silicon Etching Thomas Tillocher, Jack Nos, Gaëlle Antoun, Micromachines	2021	13
Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas Gaëlle Antoun, Thomas Tillocher, Aurélie Girard, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films	2022	13

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