Statistics
Publications
1
Citations
30
H-Index
1
Active since
2023
Affiliations
J. Nos is an author at Centre National de la Recherche Scientifique specializing in etching processes, ellipsometry, and semiconductor materials.
Publications per year
2023–2023
1
1
Cryogenic etching of silicon compounds using a CHF3 based plasma
Rémi Dussart, Rim Ettouri, J. Nos et al. · Journal of Applied Physics · 2023 · 30 citations · Full text
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