Concepedia

Publication | Open Access

Mechanism understanding in cryo atomic layer etching of SiO2 based upon C4F8 physisorption

DOIFull Paper Access

32

Citations

19

References

2021

Year

Gaëlle Antoun, Thomas Tillocher, Philippe Lefaucheux, Jacques Faguet, Kaoru Maekawa, Rémi Dussart
Scientific Reports

References

YearCitations

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