Concepedia

Digital Process for advanced VLSI's and Surface Reaction Study

Hiroyuki Sakaue, Kazushi Asami, Tsutomu Ichihara, Sawa Ishizuka, Kohei Kawamura, Y. Horiike

MRS Proceedings · 1991 · 10 citations · 8 references

DOI

Concepts

References

8

Plasma etching—A discussion of mechanisms

J. W. Coburn, Harold F. Winters · Journal of Vacuum Science and Technology · 1979 · 601 citations

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Atomic Layer Controlled Digital Etching of Silicon

Hiroyuki Sakaue, Seiji Iseda, Kazushi Asami et al. · Japanese Journal of Applied Physics · 1990 · 86 citations

, , +17

Mass and energy distribution of particles sputter etched from Si in a XeF2 environment

R.A. Haring, A. Haring, F. W. Saris et al. · Applied Physics Letters · 1982 · 73 citations

, , +14

Chemiluminescence and the reaction of molecular fluorine with silicon

J. A. Mucha, Vincent M. Donnelly, Daniel Flamm et al. · The Journal of Physical Chemistry · 1981 · 69 citations

, , +6

Digital chemical vapor deposition and etching technologies for semiconductor processing

Y. Horiike, Tomoko Tanaka, Masatake Nakano et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 68 citations · Full text

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