Concepedia

Y. Horiike

YH

28

Publications

784

Citations

18

H-Index

1983

Active since

Affiliations

Hiroshima University(Current)

Toshiba (Japan)

Toyo University

The University of Tokyo

Fukuyama University

Y. Horiike is an author at Hiroshima University specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceMicrofabricationChemical EngineeringMicroelectronicsElectrical EngineeringChemistryPhysics

Publications per year

1983–2007

28

Publications

28

Digital chemical vapor deposition and etching technologies for semiconductor processing

Y. Horiike, Tomoko Tanaka, Masatake Nakano et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 68 citations · Full text

Engineering, Digital Etching, Semiconductor Processing +19

High Rate and Highly Selective SiO<sub>2</sub> Etching Employing Inductively Coupled Plasma

Takayuki Fukasawa, Akihiro Nakamura, Haruo Shindo et al. · Japanese Journal of Applied Physics · 1994 · 67 citations

Materials Science, Sio 2, Chemical Engineering +15

Young's Interference of Electrons in Field Emission Patterns

C. Oshima, K. Mastuda, Takayuki Kona et al. · Physical Review Letters · 2002 · 60 citations

Engineering, Physics, Electron Spectroscopy +12

Excimer-laser etching on silicon

Y. Horiike, N. Hayasaka, Makoto Sekine et al. · Applied Physics A · 1987 · 54 citations

Materials Science, Engineering, Microfabrication +5

Plasma applications for biochip technology

Takanori Ichiki, Yoshinari Sugiyama, Riko Taura et al. · Thin Solid Films · 2003 · 54 citations

Electrical Engineering, Plasma Applications, Instrumentation +3

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