Concepedia

N. Hayasaka

NH

Statistics

Publications

16

Citations

593

H-Index

14

Active since

1982

Affiliations

Toshiba (Japan)(Current)

Institute for Molecular Science

N. Hayasaka is an author at Toshiba (Japan) specializing in materials science, materials engineering, and silicon materials.

Publications per year

1982–2006

16

Publications

16

Bumpless Interconnect Through Ultrafine Cu Electrodes by Means of Surface-Activated Bonding (SAB) Method

Akitsu Shigetou, Toshihiro Itoh, M. Matsuo et al. · IEEE Transactions on Advanced Packaging · 2006 · 146 citations

Engineering, Electrical Engineering, Materials Science +17

Damage-free selective etching of Si native oxides using NH3/NF3 and SF6/H2O down-flow etching

Hitoshi Nishino, N. Hayasaka, H. Okano · Journal of Applied Physics · 1993 · 82 citations

Natural Sciences, Materials Engineering, Materials Science +17

Excimer-laser etching on silicon

Y. Horiike, N. Hayasaka, Makoto Sekine et al. · Applied Physics A · 1987 · 54 citations

Engineering, Materials Engineering, Materials Science +10

Synchrotron Radiation-Assisted Etching of Silicon Surface

N. Hayasaka, Atsunari Hiraya, Kosuke Shobatake · Japanese Journal of Applied Physics · 1987 · 49 citations

Engineering, Materials Engineering, Materials Science +14

Silicon interposer technology for high-density package

M. Matsuo, N. Hayasaka, Katsuya Okumura et al. · 2002 · 42 citations

Engineering, Electrical Engineering, Materials Science +17

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