H. Okano

Damage-free selective etching of Si native oxides using NH3/NF3 and SF6/H2O down-flow etching

Hitoshi Nishino, N. Hayasaka, H. Okano · Journal of Applied Physics · 1993 · 82 citations

Natural Sciences, Materials Engineering, Materials Science +17

Photo-Excited Etching of Poly-Crystalline and Single-Crystalline Silicon in Cl₂ Atmosphere

H. Okano, Yasuhiro Horiike, Makoto Sekine · Japanese Journal of Applied Physics · 1985 · 72 citations

Engineering, Materials Engineering, Materials Science +13

Excimer-laser etching on silicon

Y. Horiike, N. Hayasaka, Makoto Sekine et al. · Applied Physics A · 1987 · 54 citations

Engineering, Materials Engineering, Materials Science +10

High-Rate Reactive Ion Etching of SiO₂ Using a Magnetron Discharge

Yasuhiro Horiike, H. Okano, Takashi Yamazaki et al. · Japanese Journal of Applied Physics · 1981 · 50 citations

Natural Sciences, Electrical Engineering, Physics +16

Self-aligned passivation on copper interconnection durability against oxidizing ambient annealing

Hitoshi Itow, Yasushi Nakasaki, G. Minamihaba et al. · Applied Physics Letters · 1993 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +17