Yasuhiro Horiike - Concepedia

Author

Yasuhiro Horiike

The University of Tokyo

Also Known As

YASUHIRO HORIIKE, Yasuhiro HORIIKE, Yasuhiro Horiike

203

Publications

3.2K

Citations

H-Index

153

Concepts

All Affiliations

The University of Tokyo Toyo University National Institute for Materials Science Toshiba (Japan)Nagoya University

About

Yasuhiro Horiike is an author at The University of Tokyo specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	29	61	2.3K
2	Applied Physics	21	34	1.2K
3	Medicine	10	10	290
4	Natural Sciences	5	5	136
5	Health Sciences	1	1	62

Yasuhiro Horiike

Publications

2.9K

Citations

H-Index

Page 1

	Year	Citations
Separation of Long DNA Molecules by Quartz Nanopillar Chips under a Direct Current Electric Field Noritada Kaji, Y. Tezuka, Yuzuru Takamura, Analytical Chemistry	2003	344
Low‐voltage electroosmosis pump for stand‐alone microfluidics devices Yuzuru Takamura, Hiroyuki Onoda, Hiromichi Inokuchi, Electrophoresis Microfabrication TechnologyLow‐voltage Electroosmosis PumpChemical EngineeringEngineeringMicromachines	2003	160
Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets Takanori Ichiki, Ryo Taura, Yasuhiro Horiike Journal of Applied Physics EngineeringPlasma PhysicsFine NozzlePlasma CombustionSilicon On Insulator	2003	151
Two‐Dimensional Multiarray Formation of Hepatocyte Spheroids on a Microfabricated PEG‐Brush Surface Hidenori Otsuka, Akihiro Hirano, Yukio Nagasaki, ChemBioChem	2004	139
An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample Takanori Ichiki, Toru Koidesawa, Yasuhiro Horiike Plasma Sources Science and Technology Liquid SampleEngineeringPlasma PhysicsAntenna ImpedanceAntenna Designs	2003	101
Atomic Layer Controlled Digital Etching of Silicon Hiroyuki Sakaue, Seiji Iseda, Kazushi Asami, Japanese Journal of Applied Physics Materials ScienceEngineeringPhysicsMicrofabricationSurface Science	1990	86
Photo-Excited Etching of Poly-Crystalline and Single-Crystalline Silicon in Cl<sub>2</sub> Atmosphere H. Okano, Yasuhiro Horiike, Makoto Sekine Japanese Journal of Applied Physics Optical MaterialsEngineeringElectron-beam LithographySilicon On InsulatorPhotovoltaics	1985	72
DNA Separation in Nanowall Array Chips Takao Yasui, Noritada Kaji, Ryō Ogawa, Analytical Chemistry Nanowall Array StructureDna NanotechnologyNanowall Array ChipEngineeringNanotechnology	2011	72
Dry Cleaning Technology for Removal of Silicon Native Oxide Employing Hot NH<sub>3</sub>/NF<sub>3</sub>Exposure Hiroki Ogawa, Tomoharu Arai, M Yanagisawa, Japanese Journal of Applied Physics Materials ScienceChemical EngineeringHot AmmoniumEngineeringEnvironmental Engineering	2002	71
Photocontrol of cell adhesion on amino-bearing surfaces by reversible conjugation of poly(ethylene glycol) via a photocleavable linker Shingo Kaneko, Hidekazu Nakayama, Yutaro Yoshino, Physical Chemistry Chemical Physics	2011	62

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