A. Haring

Energy distributions of atoms sputtered from alkali halides by 540 eV electrons

H. Overeijnder, Marek Szymoński, A. Haring et al. · Radiation Effects · 1978 · 120 citations

Nuclear Beam Physics, Engineering, Electron Diffraction +17

Argon-ion assisted etching of silicon by molecular chlorine

A. W. Kolfschoten, R.A. Haring, A. Haring et al. · Journal of Applied Physics · 1984 · 79 citations

Chemical Engineering, Engineering, Microfabrication +14

Mass and energy distribution of particles sputter etched from Si in a XeF2 environment

R.A. Haring, A. Haring, F. W. Saris et al. · Applied Physics Letters · 1982 · 73 citations

Engineering, Vacuum Device, Silicon On Insulator +16

Ion-assisted etching of silicon by molecular chlorine

F.H.M. Sanders, A. W. Kolfschoten, J. Dieleman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 65 citations

Engineering, Chemistry, Silicon On Insulator +17

Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions

J. Dieleman, F.H.M. Sanders, A. W. Kolfschoten et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1985 · 64 citations

Engineering, Integrated Circuits, Chemistry +21