A. W. Kolfschoten

Argon-ion assisted etching of silicon by molecular chlorine

A. W. Kolfschoten, R.A. Haring, A. Haring et al. · Journal of Applied Physics · 1984 · 79 citations

Chemical Engineering, Engineering, Microfabrication +14

Ion-assisted etching of silicon by molecular chlorine

F.H.M. Sanders, A. W. Kolfschoten, J. Dieleman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 65 citations

Engineering, Chemistry, Silicon On Insulator +17

Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions

J. Dieleman, F.H.M. Sanders, A. W. Kolfschoten et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1985 · 64 citations

Engineering, Integrated Circuits, Chemistry +21

Chemical sputtering by keV ions

R.A. Haring, A. W. Kolfschoten, A.E. De Vries · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1984 · 30 citations

Chemical Engineering, Engineering, Surface Science +8

Effects of Ar+ angle of incidence on the etching of Si with Cl2 and low-energy Ar+ ions

J. van Zwol, J. van de Laar, A. W. Kolfschoten et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 15 citations

Engineering, Target Fabrication, Vacuum Device +17