A 6-GHz 16-kB L1 cache in a 100-nm dual-v t technology using a bitline leakage reduction (blr) technique

Yibin Ye, Muhammad Khellah, Dinesh Somasekhar, Ali Farhang, Vivek De

IEEE Journal of Solid-State Circuits · 2003 · 21 citations · 6 references

Concepts

Abstract

This work describes an aggressive SRAM cell configuration using dual-V/sub T/ and minimum channel length to achieve high performance. A bitline leakage reduction technique is incorporated into an L1 cache design using the new cell in a 100-nm dual-V/sub T/ technology to eliminate impacts of bitline leakage on performance and noise margin with minimal area overhead. Bitline delay is 23% better than the best conventional design, thus enabling 6-GHz operation at with 15% higher energy.

References

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