Challenges of nickel silicidation in CMOS technologies

Design of ion-implanted MOSFET's with very small physical dimensions

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Towards implementation of a nickel silicide process for CMOS technologies

C. Lavoie, F. M. d’Heurle, Christophe Detavernier et al. · Microelectronic Engineering · 2003 · 406 citations

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Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition

D. Mangelinck, Jiyan Dai, Jisheng Pan et al. · Applied Physics Letters · 1999 · 263 citations

Natural Sciences, Materials Engineering, Materials Science +17

An off-normal fibre-like texture in thin films on single-crystal substrates

Christophe Detavernier, Ahmet S. Özcan, Jean Jordan‐Sweet et al. · Nature · 2003 · 189 citations · Full text

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Review of FINFET technology

M. Jurczak, Nadine Collaert, A. Veloso et al. · 2009 · 164 citations

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