Concepedia

Towards implementation of a nickel silicide process for CMOS technologies

C. Lavoie, F. M. d’Heurle, Christophe Detavernier, C. Cabral

Microelectronic Engineering · 2003 · 406 citations · 72 references

DOI

Concepts

References

72

DIGEST of TECHNICAL PAPERS

Richard S. Engelbrecht, Hsiung Hsu, Parametric Amplifiers et al. · 1959 · 1.4K citations

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Transition metals in silicon

Eicke R. Weber · Applied Physics A · 1983 · 1.2K citations

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Introduction to surface roughness and scattering

Choice Reviews Online · 1990 · 545 citations

, , +10

Metastable phase formation in titanium-silicon thin films

R. Beyers, Robert Sinclair · Journal of Applied Physics · 1985 · 401 citations

, , +17

Nucleation of a new phase from the interaction of two adjacent phases: Some silicides

F. M. d’Heurle · Journal of materials research/Pratt's guide to venture capital sources · 1988 · 398 citations

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