Concepedia

Silicide Contacts

Silicide Contact is a type of metal-semiconductor contact formed by the reaction of a refractory metal with a semiconductor substrate to create a metallic silicide phase that provides low-resistivity electrical connection while maintaining thermal and chemical stability.

893

Publications

35.6K

Citations

3.1K

Authors

586

Institutions

Publications per year

2017–2026

48

Parents

Publications

893

Towards implementation of a nickel silicide process for CMOS technologies

C. Lavoie, F. M. d’Heurle, Christophe Detavernier et al. · Microelectronic Engineering · 2003 · 406 citations

, , +12

Silicides and ohmic contacts

J. Gambino, E. G. Colgan · Materials Chemistry and Physics · 1998 · 389 citations

, , +7

Metal Silicides in CMOS Technology: Past, Present, and Future Trends

Shi‐Li Zhang, Mikael Östling · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 2003 · 364 citations

, , +17

Analysis of the Parasitic S/D Resistance in Multiple-Gate FETs

Abhisek Dixit, Anil Kottantharayil, Nadine Collaert et al. · IEEE Transactions on Electron Devices · 2005 · 355 citations

, , +16

Role of virtual gap states and defects in metal-semiconductor contacts

Winfried Mönch · Physical Review Letters · 1987 · 339 citations

, , +17

1–5 of 893

Authors

3.1K

  1. KM
    Karen Maex

    IMEC, Belgium

    23 publications · 1.3K citations

    20

    h-index

  2. AL
    A. Lauwers

    IMEC, Belgium

    21 publications · 864 citations

    18

    h-index

  3. JA
    J. A. Kittl

    IMEC, Belgium

    13 publications · 503 citations

    12

    h-index

  4. KN
    K. N. Tu

    University of California, Los Angeles, United States

    11 publications · 315 citations

    11

    h-index

  5. MÖ
    Mikael Östling

    KTH Royal Institute of Technology, Sweden

    11 publications · 730 citations

    11

    h-index

1–5 of 3.1K

Institutions

586

  1. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    34 h-index

    229 publications

    11.4K citations

  2. IMEC

    Leuven, Belgium

    28 h-index

    319 publications

    14K citations

  3. IBM (United States)

    Armonk, United States

    27 h-index

    193 publications

    10.2K citations

  4. KU Leuven

    Leuven, Belgium

    23 h-index

    77 publications

    3.6K citations

  5. Centre National de la Recherche Scientifique

    Paris, France

    19 h-index

    128 publications

    5.2K citations

  6. Texas Instruments (United States)

    Dallas, United States

    17 h-index

    72 publications

    3.4K citations

  7. KTH Royal Institute of Technology

    Stockholm, Sweden

    15 h-index

    68 publications

    3K citations

  8. Hodges University

    Naples, United States

    15 h-index

    19 publications

    934 citations

1–8 of 586

Venues

  1. Journal of Applied Physics

    66 publications · 3.1K citations

    33

    h-index

  2. Applied Physics Letters

    61 publications · 2.3K citations

    28

    h-index

  3. IEEE Transactions on Electron Devices

    57 publications · 3.1K citations

    28

    h-index

  4. IEEE Electron Device Letters

    51 publications · 1.8K citations

    26

    h-index

  5. Thin Solid Films

    60 publications · 2.1K citations

    25

    h-index

1–5