N. Breil

Challenges of nickel silicidation in CMOS technologies

N. Breil, C. Lavoie, Ahmet S. Özcan et al. · Microelectronic Engineering · 2014 · 54 citations

Engineering, Electrical Engineering, Materials Science +8

Arsenic-Segregated Rare-Earth Silicide Junctions: Reduction of Schottky Barrier and Integration in Metallic n-MOSFETs on SOI

Guilhem Larrieu, D.A. Yarekha, Emmanuel Dubois et al. · IEEE Electron Device Letters · 2009 · 48 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

(Invited) Contacts in Advanced CMOS: History and Emerging Challenges

C. Lavoie, Praneet Adusumilli, Adra Carr et al. · ECS Transactions · 2017 · 47 citations

Engineering, Electrical Engineering, Materials Science +17

RF Small-Signal Analysis of Schottky-Barrier p-MOSFET

RaphaËl Valentin, Emmanuel Dubois, Jean‐Pierre Raskin et al. · IEEE Transactions on Electron Devices · 2008 · 39 citations · Full text

Engineering, Electrical Engineering, Circuit Theory +16

Ultra-low NMOS contact resistivity using a novel plasma-based DSS implant and laser anneal for post 7 nm nodes

Chi‐Nung Ni, K. V. Rao, Fareen Adeni Khaja et al. · 2016 · 39 citations

Engineering, Electrical Engineering, Materials Science +17