Fareen Adeni Khaja

Ultra-low NMOS contact resistivity using a novel plasma-based DSS implant and laser anneal for post 7 nm nodes

Chi‐Nung Ni, K. V. Rao, Fareen Adeni Khaja et al. · 2016 · 39 citations

Engineering, Laser Anneal, Optoelectronic Devices +17

Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation

Hao Yu, Marc Schaekers, Andriy Hikavyy et al. · 2016 · 34 citations

Materials Engineering, Materials Science, Electrical Engineering +15

Sub-10⁻⁹ Ω·cm² contact resistivity on p-SiGe achieved by Ga doping and nanosecond laser activation

J-L. Everaert, Marc Schaekers, Hao Yu et al. · 2017 · 31 citations

Engineering, Nuclear Physics, Nanosecond Laser Activation +21

Fin Doping by Hot Implant for 14nm FinFET Technology and Beyond

Bingxi Wood, Fareen Adeni Khaja, B. Colombeau et al. · ECS Transactions · 2013 · 28 citations

Electrical Engineering, Engineering, Finfet Device Structure +10

Drain current variability and MOSFET parameters correlations in planar FDSOI technology

J. Mazurier, O. Weber, F. Andrieu et al. · 2011 · 28 citations

Sub Xmlns, Engineering, Planar Fdsoi Technology +18