Concepedia

The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications

B. Toomey, K. Cherkaoui, Scott Monaghan, Vladimir Djara, Eileen O’Connor, Donal O’Connell, L. Oberbeck, E. Tois, Tom Blomberg, S. B. Newcomb,

Microelectronic Engineering · 2012 · 13 citations · 13 references

Open access

Concepts

Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesDielectric CeramicsDielectric MaterialsDielectric PropertiesDielectric ResponseDielectricsElectrical Properties Of CeramicsCapacitor DielectricsCeramic DielectricsDielectric CharacterizationDielectric FunctionDielectric InterfacesDielectric MeasurementOxide Dielectrics

References

13

The High-k Solution

M. Bohr, R. Chau, T. Ghani et al. · IEEE Spectrum · 2007 · 382 citations

Engineering, Computer Engineering, Electrical Engineering +11

Handbook of Semiconductor Manufacturing Technology

M. Henini · Microelectronics Journal · 2001 · 312 citations

Engineering, Manufacturing Engineering, Manufacturing Processes +11

SOLID STATE ELECTRONICS

Chemical & Engineering News · 1960 · 199 citations · Full text

Engineering, Electrical Engineering, Condensed Matter Physics +3

Analog characteristics of metal-insulator-metal capacitors using PECVD nitride dielectrics

J.A. Babcock, S. Balster, A. Pinto et al. · IEEE Electron Device Letters · 2001 · 179 citations

Engineering, Electrical Engineering, Analog Electronics +12

Higher permittivity rare earth doped HfO2 for sub-45-nm metal-insulator-semiconductor devices

S. Govindarajan, T. S. Böscke, P. Sivasubramani et al. · Applied Physics Letters · 2007 · 126 citations

Natural Sciences, Materials Engineering, Materials Science +17