Process and Material Properties of HfLaO[sub x] Prepared by Atomic Layer Deposition - Concepedia

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Process and Material Properties of HfLaO[sub x] Prepared by Atomic Layer Deposition

34

Citations

24

References

2008

Year

Wei He, Daniel S. H. Chan, Sun-Jung Kim, Young‐Sun Kim, Sung‐Tae Kim, Byung Jin Cho

Journal of The Electrochemical Society

Abstract

10.1149/1.2960995

References

	Year	Citations

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