Atomic Layer Deposition is a vapor-phase thin-film deposition technique that achieves precise, layer-by-layer growth through self-limiting surface reactions between gaseous precursors.
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A library of atomically thin metal chalcogenides
Jiadong Zhou, Junhao Lin, Xiangwei Huang et al. · Nature · 2018 · 1.7K citations
Natural Sciences, Materials Engineering, Materials Science +12
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University of Colorado Boulder
Boulder, United States
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892 publications
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Argonne National Laboratory
Lemont, United States
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Eindhoven University of Technology
Eindhoven, The Netherlands
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Stanford, United States
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Helsinki, Finland
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Evanston, United States
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Seoul, South Korea
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- Applied Physics Letters
642 publications · 40.1K citations
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