Riikka L. Puurunen - Concepedia

Author

Riikka L. Puurunen

VTT Technical Research Centre of Finland ORCID

Also Known As

Puurunen, Riikka, Puurunen, Riikka L., R Puurunen, R. L. Puurunen, R. Puurunen, R.L Puurunen, R.L. Puurunen, R. L. Puurunen, Riikka L Puurunen, Riikka L. Puurunen

220

Publications

8.4K

Citations

H-Index

Concepts

All Affiliations

VTT Technical Research Centre of Finland Aalto University University of Jyväskylä IMEC Tieto (Finland)

About

Riikka L. Puurunen is an author at VTT Technical Research Centre of Finland specializing in materials science, engineering, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	34	59	7.8K
2	Applied Physics	28	41	4.4K
3	Chemical Engineering	16	19	3.5K
4	Natural Sciences	7	7	958
5	Health Sciences	1	1	33

Riikka L. Puurunen

Publications

8.1K

Citations

H-Index

Page 1

	Year	Citations
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process Riikka L. Puurunen Journal of Applied Physics Materials ScienceSurface TechnologyChemical EngineeringSpecific AldEngineering	2005	2.5K
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends Ville Miikkulainen, Markku Leskelä, Mikko Ritala, Journal of Applied Physics Materials ScienceInorganic ChemistryZirconium OxideEngineeringInorganic Films	2013	1.4K
Conformality in atomic layer deposition: Current status overview of analysis and modelling Véronique Cremers, Riikka L. Puurunen, Jolien Dendooven Applied Physics Reviews EngineeringNanostructured SurfaceChemistryChemical DepositionNanotechnology Applications	2019	474
Island growth as a growth mode in atomic layer deposition: A phenomenological model Riikka L. Puurunen, Wilfried Vandervorst Journal of Applied Physics Aluminium NitrideEngineeringCrystal Growth TechnologyPhenomenological ModelGpc Curves	2004	321
A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy Riikka L. Puurunen Chemical Vapor Deposition New TechnologiesEngineeringFinnish InventorThin Film Process TechnologyChemistry	2014	227
Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model Riikka L. Puurunen Chemical Vapor Deposition EngineeringCrystal Growth TechnologyChemistryChemical DepositionGrowth Per Cycle	2003	203
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion Oili Ylivaara, Xuwen Liu, Lauri Kilpi, Thin Solid Films Materials ScienceMaterials EngineeringAluminium NitrideEngineeringAluminum Oxide	2013	183
Spectroscopic Study on the Irreversible Deactivation of Chromia/Alumina Dehydrogenation Catalysts Riikka L. Puurunen Journal of Catalysis Materials ScienceEngineeringCatalysisChemistryCatalyst Preparation	2002	163
Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy Riikka L. Puurunen, Wilfried Vandervorst, W.F.A. Besling, Journal of Applied Physics Zirconium OxideEngineeringChemical DepositionSilicon On InsulatorSurface Technology	2004	155
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water Riikka L. Puurunen Applied Surface Science Materials ScienceAluminium NitrideEngineeringAluminum OxideSurface Chemistry	2004	114

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