Wilfried Vandervorst

Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices

Umberto Celano, Ludovic Goux, Attilio Belmonte et al. · Nano Letters · 2014 · 332 citations

Observed Filament, Such Filament, Engineering +19

Island growth as a growth mode in atomic layer deposition: A phenomenological model

Riikka L. Puurunen, Wilfried Vandervorst · Journal of Applied Physics · 2004 · 321 citations

Aluminium Nitride, Engineering, Crystal Growth Technology +16

Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si–O–H) and thermal oxide (SiO2 or Si–O–N) underlayers

M. L. Green, M.-Y. Ho, B. Busch et al. · Journal of Applied Physics · 2002 · 278 citations

Film Nucleation, Engineering, Chemistry +20

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

Hiroshi Nohira, Wei‐Bor Tsai, W.F.A. Besling et al. · Journal of Non-Crystalline Solids · 2002 · 249 citations

Materials Science, Materials Engineering, Aluminium Nitride +7

High-k dielectrics for future generation memory devices (Invited Paper)

J. A. Kittl, Karl Opsomer, M. Popovici et al. · Microelectronic Engineering · 2009 · 246 citations

Electrical Engineering, Semiconductor Device, Engineering +7