Concepedia

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

Hiroshi Nohira, Wei‐Bor Tsai, W.F.A. Besling, Edward Young, J. Pétry, Thierry Conard, Wilfried Vandervorst, Stefan De Gendt, Marc Heyns, Jan Willem Maes,

Journal of Non-Crystalline Solids · 2002 · 254 citations · 9 references

DOI

Concepts

References

9

Hafnium and zirconium silicates for advanced gate dielectrics

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 972 citations

, , +17

Structure and stability of ultrathin zirconium oxide layers on Si(001)

M. Copel, M. Gribelyuk, Evgeni Gusev · Applied Physics Letters · 2000 · 667 citations

, , +17

The Thickogram: a method for easy film thickness measurement in XPS

Peter J. Cumpson · Surface and Interface Analysis · 2000 · 187 citations

, , +8

Local transport and trapping issues in Al2O3 gate oxide structures

R. Ludeke, M. Teresa Cuberes, E. Cartier · Applied Physics Letters · 2000 · 113 citations

, , +17

Charge trapping in very thin high-permittivity gate dielectric layers

Michel Houssa, A. Stesmans, M. Naili et al. · Applied Physics Letters · 2000 · 78 citations

, , +17