Jan Willem Maes

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

Hiroshi Nohira, Wei‐Bor Tsai, W.F.A. Besling et al. · Journal of Non-Crystalline Solids · 2002 · 254 citations

Natural Sciences, Materials Engineering, Materials Science +14

High-k dielectrics for future generation memory devices (Invited Paper)

J. A. Kittl, Karl Opsomer, M. Popovici et al. · Microelectronic Engineering · 2009 · 250 citations

Natural Sciences, Materials Engineering, Materials Science +16

Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties

W.F.A. Besling, Edward Young, Thierry Conard et al. · Journal of Non-Crystalline Solids · 2002 · 95 citations

Natural Sciences, Materials Engineering, Materials Science +12

Remote-charge-scattering limited mobility in field-effect transistors with SiO2 and Al2O3∕SiO2 gate stacks

Kazuyoshi Torii, Yasuhiro Shimamoto, Osamu Tonomura et al. · Journal of Applied Physics · 2005 · 69 citations

Engineering, Electrical Engineering, Physics +17

Atomic Layer Deposition of Strontium Titanate Films Using Sr([sup t]Bu[sub 3]Cp)[sub 2] and Ti(OMe)[sub 4]

M. Popovici, Sven Van Elshocht, N. Menou et al. · Journal of The Electrochemical Society · 2009 · 61 citations

Natural Sciences, Materials Engineering, Materials Science +17