W.F.A. Besling

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

Hiroshi Nohira, Wei‐Bor Tsai, W.F.A. Besling et al. · Journal of Non-Crystalline Solids · 2002 · 254 citations

Natural Sciences, Materials Engineering, Materials Science +14

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Riikka L. Puurunen, Wilfried Vandervorst, W.F.A. Besling et al. · Journal of Applied Physics · 2004 · 156 citations

Natural Sciences, Materials Engineering, Materials Science +17

Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films

W.F.A. Besling, A. Goossens, Ben Meester et al. · Journal of Applied Physics · 1998 · 123 citations

Natural Sciences, Materials Engineering, Materials Science +17

Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition

Kai‐Erik Elers, Ville Saanila, P. Soininen et al. · Chemical Vapor Deposition · 2002 · 96 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties

W.F.A. Besling, Edward Young, Thierry Conard et al. · Journal of Non-Crystalline Solids · 2002 · 95 citations

Natural Sciences, Materials Engineering, Materials Science +12