Kai‐Erik Elers

Film Uniformity in Atomic Layer Deposition

Kai‐Erik Elers, Tom Blomberg, M. Peussa et al. · Chemical Vapor Deposition · 2006 · 124 citations

Materials Science, Surface Technology, Engineering +11

Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition

Kai‐Erik Elers, Ville Saanila, P. Soininen et al. · Chemical Vapor Deposition · 2002 · 94 citations

Engineering, Diffusion Barrier Materials, Step Coverage +16

TiCl[sub 4] as a Precursor in the TiN Deposition by ALD and PEALD

Kai‐Erik Elers, Jerry Winkler, K. Doran Weeks et al. · Journal of The Electrochemical Society · 2005 · 77 citations

Engineering, Tin Film Deposition, Chemistry +17

Reduction of Copper Oxide Film to Elemental Copper

P. Soininen, Kai‐Erik Elers, Ville Saanila et al. · Journal of The Electrochemical Society · 2005 · 63 citations

Materials Science, Electrometallurgy, Chemical Engineering +13

NbCl5 as a precursor in atomic layer epitaxy

Kai‐Erik Elers, Mikko Ritala, Markku Leskelä et al. · Applied Surface Science · 1994 · 54 citations

Materials Science, Engineering, Atomic Layer Epitaxy +5