P. Soininen

Growth of titanium dioxide thin films by atomic layer epitaxy

Mikko Ritala, Markku Leskelä, E. Nykänen et al. · Thin Solid Films · 1993 · 306 citations

Materials Science, Epitaxial Growth, Engineering +8

Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala, Markku Leskelä, Jan-Pieter Dekker et al. · Chemical Vapor Deposition · 1999 · 298 citations

Materials Science, Materials Engineering, Aluminium Nitride +15

Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method

Lassi Hiltunen, Markku Leskelä, Maarit Mäkelä et al. · Thin Solid Films · 1988 · 101 citations

Materials Engineering, Materials Science, Engineering +5

Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition

Kai‐Erik Elers, Ville Saanila, P. Soininen et al. · Chemical Vapor Deposition · 2002 · 94 citations

Engineering, Diffusion Barrier Materials, Step Coverage +16

Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes

Lassi Hiltunen, H. Kattelus, Markku Leskelä et al. · Materials Chemistry and Physics · 1991 · 85 citations

Materials Engineering, Materials Science, Engineering +8