Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method

Structure and properties of TiN coatings

J.‐E. Sundgren · Thin Solid Films · 1985 · 897 citations

Materials Science, Materials Engineering, Engineering +5

Atomic layer epitaxy

C. H. L. Goodman, M. Pessa · Journal of Applied Physics · 1986 · 294 citations

Engineering, Atomic Layer Epitaxy, Chemistry +16

UPPER-CRITICAL-FIELD LIMITS FOR BULK TYPE-II SUPERCONDUCTORS

R. R. Hake · Applied Physics Letters · 1967 · 128 citations

Critical Currents, Superconducting Material, High-tc Superconductivity +15

Properties of NbN thin films deposited on ambient temperature substrates

D. D. Bacon, A. T. English, S. Nakahara et al. · Journal of Applied Physics · 1983 · 116 citations

Superconducting Material, Engineering, Thin Film Process Technology +21

Ti–N phases formed by reactive ion plating

J. M. Molarius, Ari Korhonen, E.O. Ristolainen · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 99 citations

Materials Science, Materials Engineering, Chemical Engineering +14