Nitride Thin Films

Nitride Thin Film is a semiconductor thin film composed of nitrogen-rich compounds, typically deposited via atomic layer deposition, distinguished by its high thermal stability, chemical inertness, and dielectric properties essential for advanced electronic device applications.

7K

Publications

290K

Citations

22.1K

Authors

3K

Institutions

Publications per year

2017–2026

1K

Variants

Nitride Thin Film

Authors

22.1K

  1. LH
    Lars Hultman

    Linköping University, Sweden

    35 publications · 4.1K citations

    27

    h-index

  2. RF
    R. F. Davis

    North Carolina State University, United States

    37 publications · 2.6K citations

    22

    h-index

  3. WZ
    Wenjun Zhang

    City University of Hong Kong, Hong Kong SAR China

    27 publications · 1.5K citations

    20

    h-index

  4. WZ
    Weitao Zheng

    Jilin University, China

    28 publications · 1.2K citations

    19

    h-index

  5. RG
    Roy G. Gordon

    Harvard University, United States

    21 publications · 1.7K citations

    19

    h-index

1–5 of 22.1K

Venues

  1. Applied Physics Letters

    483 publications · 23.6K citations

    80

    h-index

  2. Journal of Applied Physics

    357 publications · 21.1K citations

    71

    h-index

  3. Thin Solid Films

    603 publications · 23.7K citations

    69

    h-index

  4. Surface and Coatings Technology

    504 publications · 20K citations

    65

    h-index

  5. 55

    h-index

1–5