Thierry Conard

Effective electrical passivation of Ge(100) for high-k gate dielectric layers using germanium oxide

Annelies Delabie, Florence Bellenger, Michel Houssa et al. · Applied Physics Letters · 2007 · 270 citations

Engineering, Proper Passivation, Al2o3 Ald +21

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

Hiroshi Nohira, Wei‐Bor Tsai, W.F.A. Besling et al. · Journal of Non-Crystalline Solids · 2002 · 249 citations

Materials Science, Materials Engineering, Aluminium Nitride +7

High-k dielectrics for future generation memory devices (Invited Paper)

J. A. Kittl, Karl Opsomer, M. Popovici et al. · Microelectronic Engineering · 2009 · 246 citations

Electrical Engineering, Semiconductor Device, Engineering +7

Organic and perovskite solar cells for space applications

Ilaria Cardinaletti, Tim Vangerven, Steven Nagels et al. · Solar Energy Materials and Solar Cells · 2018 · 211 citations · Full text

Materials Science, Engineering, Perovskite Solar Cell +5

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Riikka L. Puurunen, Wilfried Vandervorst, W.F.A. Besling et al. · Journal of Applied Physics · 2004 · 155 citations

Zirconium Oxide, Engineering, Chemical Deposition +16