Annelies Delabie

Effective electrical passivation of Ge(100) for high-k gate dielectric layers using germanium oxide

Annelies Delabie, Florence Bellenger, Michel Houssa et al. · Applied Physics Letters · 2007 · 270 citations

Engineering, Materials Engineering, Materials Science +17

High-k dielectrics for future generation memory devices (Invited Paper)

J. A. Kittl, Karl Opsomer, M. Popovici et al. · Microelectronic Engineering · 2009 · 250 citations

Natural Sciences, Materials Engineering, Materials Science +16

CMOS Process-Compatible High-Power Low-Leakage AlGaN/GaN MISHEMT on Silicon

M. Van Hove, S. Boulay, S.R. Bahl et al. · IEEE Electron Device Letters · 2012 · 206 citations

Engineering, Computer Engineering, Electrical Engineering +17

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Riikka L. Puurunen, Wilfried Vandervorst, W.F.A. Besling et al. · Journal of Applied Physics · 2004 · 156 citations

Natural Sciences, Materials Engineering, Materials Science +17

Germanium surface passivation and atomic layer deposition of high-<i>k</i>dielectrics—a tutorial review on Ge-based MOS capacitors

Qi Xie, Shaoren Deng, Marc Schaekers et al. · Semiconductor Science and Technology · 2012 · 155 citations

Engineering, Materials Engineering, Materials Science +17