Area-selective Deposition
Area-Selective Deposition is a thin-film deposition technique that selectively grows material on specific regions of a substrate while leaving other regions bare, enabled by differences in surface chemistry or patterning without requiring post-deposition etching.
311
Publications
13.7K
Citations
1.3K
Authors
322
Institutions
Publications per year
2017–2026
137
311
1–5 of 311
1.3K
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322
Stanford University
Stanford, United States
23 h-index
95 publications
6.5K citations
Eindhoven University of Technology
Eindhoven, The Netherlands
18 h-index
108 publications
7.4K citations
IMEC
Leuven, Belgium
16 h-index
104 publications
3.3K citations
North Carolina State University
Raleigh, United States
16 h-index
50 publications
2.6K citations
Lam Research (United States)
Fremont, United States
14 h-index
50 publications
2K citations
KU Leuven
Leuven, Belgium
14 h-index
42 publications
1.4K citations

Centre National de la Recherche Scientifique
Paris, France
11 h-index
55 publications
1.5K citations

Hanyang University
Seoul, South Korea
10 h-index
37 publications
1.1K citations
1–8 of 322
32 publications · 2.3K citations
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19 publications · 772 citations
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24 publications · 678 citations
17
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17 publications · 666 citations
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21 publications · 1.2K citations
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