Area-selective Deposition

Area-Selective Deposition is a thin-film deposition technique that selectively grows material on specific regions of a substrate while leaving other regions bare, enabled by differences in surface chemistry or patterning without requiring post-deposition etching.

311

Publications

13.7K

Citations

1.3K

Authors

322

Institutions

Publications per year

2017–2026

137

Authors

1.3K

  1. SF
    Stacey F. Bent

    Stanford University, United States

    25 publications · 1.8K citations

    21

    h-index

  2. AJ
    Adriaan J. M. Mackus

    Eindhoven University of Technology, Netherlands

    20 publications · 1.5K citations

    18

    h-index

  3. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    20 publications · 1.4K citations

    18

    h-index

  4. GN
    Gregory N. Parsons

    North Carolina State University, United States

    14 publications · 1K citations

    14

    h-index

  5. WK
    Woo‐Hee Kim

    Yonsei University, South Korea

    11 publications · 698 citations

    11

    h-index

1–5 of 1.3K

Venues

  1. Chemistry of Materials

    32 publications · 2.3K citations

    25

    h-index

  2. 17

    h-index

  3. Journal of Crystal Growth

    24 publications · 678 citations

    17

    h-index

  4. ACS Applied Materials & Interfaces

    17 publications · 666 citations

    16

    h-index

  5. Applied Physics Letters

    21 publications · 1.2K citations

    16

    h-index

1–5