Robert D. Clark

Critical Role of Interlayer in Hf_0.5Zr_0.5O₂ Ferroelectric FET Nonvolatile Memory Performance

Kai Ni, Pankaj Sharma, Jianchi Zhang et al. · IEEE Transactions on Electron Devices · 2018 · 432 citations

Natural Sciences, Electrical Engineering, Materials Science +13

Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

Gregory N. Parsons, Robert D. Clark · Chemistry of Materials · 2020 · 345 citations

Natural Sciences, Materials Engineering, Materials Science +17

Perspective: New process technologies required for future devices and scaling

Robert D. Clark, Kandabara Tapily, K.H. Yu et al. · APL Materials · 2018 · 192 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Synthesis and Comparative η¹-Alkyl and Sterically Induced Reduction Reactivity of (C₅Me₅)₃Ln Complexes of La, Ce, Pr, Nd, and Sm

William J. Evans, J.M. Perotti, Stosh A. Kozimor et al. · Organometallics · 2005 · 134 citations

Natural Sciences, Chemistry, Inorganic Chemistry +11

Complete band offset characterization of the HfO2/SiO2/Si stack using charge corrected x-ray photoelectron spectroscopy

Eric Bersch, Ming Di, Steven Consiglio et al. · Journal of Applied Physics · 2010 · 132 citations

Natural Sciences, Materials Science, Physics +17