Improvement of high resolution lithography by using amorphous carbon hard mask

Supercritical drying for nanostructure fabrication without pattern collapse

Hideo Namatsu, Kenji Yamazaki, Kenji Kurihara · Microelectronic Engineering · 1999 · 100 citations

Natural Sciences, Materials Engineering, Materials Science +12

Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes

J. Thiault, J. Foucher, J.H. Tortai et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 31 citations

Engineering, Electrical Engineering, Materials Science +17

Carbon etching with a high density plasma etcher

Kevin A. Pears, Jens Stolze · Microelectronic Engineering · 2005 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +12

Image collapse issues in photoresist

John P. Simons, Darı́o L. Goldfarb, Marie Angelopoulos et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 21 citations

Engineering, Materials Engineering, Materials Science +15

A Novel Approach for the Patterning and High-Volume Production of Sub-40-nm Gates

Karen Romero, Ralf Stephan, M. Mazur et al. · IEEE Transactions on Semiconductor Manufacturing · 2005 · 20 citations

Engineering, Electrical Engineering, Materials Science +15