Supercritical drying for nanostructure fabrication without pattern collapse

Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water

Hideo Namatsu, Kenji Kurihara, Masao Nagase et al. · Applied Physics Letters · 1995 · 124 citations

Engineering, Materials Engineering, Materials Science +17

Fabrication of sub-10-nm silicon lines with minimum fluctuation

H. Namatsu, Masao Nagase, K. Kurihara et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 58 citations

Engineering, Materials Engineering, Materials Science +16

Mechanism of Resist Pattern Collapse

Toshihiko Tanaka, Mitsuaki Morigami, Nobufumi Atoda · Journal of The Electrochemical Society · 1993 · 45 citations

Natural Sciences, Materials Engineering, Materials Science +14