Journal of The Electrochemical Society · 1993 · 45 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceInterface SciencePattern FormationSurface ScienceAtomic Force MicroscopyResistance MeasurementThin-film PatterningAtomic Force Microscopy AnalysisCapillary FlowCapillary Force EffectsForce MeasurementNoncontact Atomic Force MicroscopyPattern CollapseResist DevelopmentThin Film Resist Processing
In this paper, the mechanism of resist pattern collapse during the resist development process is investigated by the use of atomic force microscope measurement of a pattern in the rinse liquid. The resist pattern collapse occurs during the rinse liquid is dried off, and the cause of collapse is the capillary force of the rinse liquid.