Pattern Collapse
Pattern Collapse is a structural failure mode in nanoscale lithography wherein high-aspect-ratio resist patterns irreversibly deform or topple during post-processing due to unbalanced capillary forces exceeding the pattern’s mechanical stability.
111
Publications
3.7K
Citations
503
Authors
108
Institutions
Publications per year
2017–2026
10
Parents
111
Replica Molding of High-Aspect-Ratio Polymeric Nanopillar Arrays with High Fidelity
Ying Zhang, Chi-Wei Lo, J. Ashley Taylor et al. · Langmuir · 2006 · 221 citations
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IMEC
Leuven, Belgium
8 h-index
37 publications
815 citations
Fujifilm (Japan)
Tokyo, Japan
6 h-index
30 publications
733 citations
Hitachi (Japan)
Tokyo, Japan
5 h-index
10 publications
262 citations
University of Wisconsin–Madison
Madison, United States
5 h-index
11 publications
412 citations

Hanyang University
Seoul, South Korea
5 h-index
11 publications
150 citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
4 h-index
10 publications
272 citations

Cornell University
Ithaca, United States
4 h-index
22 publications
1.3K citations
Dai Nippon Printing (Japan)
Tokyo, Japan
4 h-index
13 publications
256 citations
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40 publications · 889 citations
17
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13 publications · 298 citations
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JJAP · 11 publications · 610 citations
11
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6 publications · 95 citations
6
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4 publications · 61 citations
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