Pattern Collapse

Pattern Collapse is a structural failure mode in nanoscale lithography wherein high-aspect-ratio resist patterns irreversibly deform or topple during post-processing due to unbalanced capillary forces exceeding the pattern’s mechanical stability.

111

Publications

3.7K

Citations

503

Authors

108

Institutions

Publications per year

2017–2026

10

Authors

503

  1. HO
    Hiroaki Oizumi

    Association of Super-Advanced Electronics, Japan

    8 publications · 217 citations

    8

    h-index

  2. TI
    Toshiro Itani

    The University of Osaka, Japan

    6 publications · 116 citations

    6

    h-index

  3. HT
    Hideaki Tsubaki

    Fujifilm (Japan), Japan

    6 publications · 138 citations

    6

    h-index

  4. HT
    Hiroo Takizawa

    Fujifilm (Japan), Japan

    5 publications · 127 citations

    5

    h-index

  5. TT
    Toshihiko Tanaka

    Yamaguchi University, Japan

    5 publications · 494 citations

    5

    h-index

1–5 of 503

Venues

  1. 17

    h-index

  2. Journal of Photopolymer Science and Technology

    13 publications · 298 citations

    11

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 11 publications · 610 citations

    11

    h-index

  4. ECS Transactions

    6 publications · 95 citations

    6

    h-index

  5. Nanotechnology

    4 publications · 61 citations

    4

    h-index

1–5