Hideaki Tsubaki

EUV resist materials design for 15nm half pitch and below

Hideaki Tsubaki, Shinji Tarutani, N. Inoue et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 43 citations

Natural Sciences, Materials Engineering, Materials Science +14

Characterizing Polymer bound PAG Type EUV Resist

Shinji Tarutani, Hiroshi Tamaoki, Hideaki Tsubaki et al. · Journal of Photopolymer Science and Technology · 2011 · 36 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +14

Development of materials and processes for double patterning toward 32- nm node 193- nm immersion lithography process

Shinji Tarutani, Hideaki Tsubaki, Shinichi Kanna · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 35 citations

Engineering, Materials Engineering, Materials Science +7

Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process

Shinji Tarutani, Hideaki Tsubaki, Sou Kamimura · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 27 citations

Engineering, Materials Engineering, Materials Science +12

Development of Materials and Processes for Double Patterning toward 32nm Node ArF Immersion Lithography

Shinji Tarutani, Hideaki Tsubaki, Shinichi Kanna · Journal of Photopolymer Science and Technology · 2008 · 26 citations · Full text

Engineering, Materials Engineering, Materials Science +8