Concepedia

Carbon etching with a high density plasma etcher

Kevin A. Pears, Jens Stolze

Microelectronic Engineering · 2005 · 22 citations · 1 references

DOI

Concepts

References

1

Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Wei Liu, David Mui, Thorston Lill et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 19 citations

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