<title>Electron-optical design for the SCALPEL proof-of-concept tool</title>

Abstract

A proof-of-concept experimental lithography tool, based upon the SCALPEL<SUP>TM</SUP> principle, is currently being fabricated at AT&T Bell Laboratories. Designed from a lithographic system perspective, we feel that this experimental platform is the minimal configuration necessary to evaluate this specific printing technique, consistent with design rules from 0.18 micrometers to 0.09 micrometers . Details of the machine's electron-optics are presented, including the calculated performance of the electromagnetic lens systems. The critical lithography issues which will be examined using this tool are also discussed.