Electron Beam Focusing

Electron Beam Focusing is the process of confining and directing an electron beam into a narrow, precisely controlled path or spot using electromagnetic or electrostatic fields to achieve enhanced spatial resolution and energy density in applications such as microscopy, lithography, and particle acceleration.

2.1K

Publications

87.4K

Citations

7.4K

Authors

1.5K

Institutions

Publications per year

2017–2026

323

Authors

7.4K

  1. IU
    Ivo Utke

    Swiss Federal Laboratories for Materials Science and Technology, Switzerland

    29 publications · 2.3K citations

    22

    h-index

  2. PH
    P. Hoffmann

    École Polytechnique Fédérale de Lausanne, Switzerland

    19 publications · 2K citations

    17

    h-index

  3. HP
    Harald Plank

    Graz University of Technology, Austria

    14 publications · 660 citations

    14

    h-index

  4. JB
    J. B. Rosenzweig

    University of California, Los Angeles, United States

    14 publications · 986 citations

    13

    h-index

  5. PK
    P. Kruit

    Delft University of Technology, Netherlands

    13 publications · 441 citations

    11

    h-index

1–5 of 7.4K

Venues

  1. Physical Review Letters

    PRL · 71 publications · 5.7K citations

    43

    h-index

  2. Applied Physics Letters

    76 publications · 4.3K citations

    34

    h-index

  3. Journal of Applied Physics

    82 publications · 3.4K citations

    30

    h-index

  4. 28

    h-index

  5. Ultramicroscopy

    55 publications · 2.4K citations

    27

    h-index

1–5