Steven D. Berger

Measurement of the backscatter coefficient using resist response curves for 20–100 keV electron beam lithography on Si

G. P. Watson, Diana Fu, Steven D. Berger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 23 citations

Electrical Engineering, Engineering, Electron-beam Lithography +13

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

J. Alexander Liddle, Steven D. Berger, C. J. Biddick et al. · Japanese Journal of Applied Physics · 1995 · 21 citations

Engineering, Electron-beam Lithography, Physics +12

A background dose proximity effect correction technique for scattering with angular limitation projection electron lithography implemented in hardware

G. P. Watson, Steven D. Berger, J. Alexander Liddle et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 17 citations

Engineering, Electron-beam Lithography, Microscopy +16

<title>Electron-optical design for the SCALPEL proof-of-concept tool</title>

W. K. Waskiewicz, Steven D. Berger, L. R. Harriott et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 16 citations

Engineering, T Bell Laboratories, Physics +15

SCALPEL proof-of-concept system: preliminary lithography results

W. K. Waskiewicz, Christopher J. Biddick, Myrtle I. Blakey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 11 citations

Engineering, Scattering Mask, Electron-beam Lithography +19