C. J. Biddick

Mask assisted off-axis illumination technique for random logic

Joseph G. Garofalo, C. J. Biddick, R. L. Kostelak et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 35 citations

Computing, Computer Systems, Computer Vision +9

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

J. Alexander Liddle, Steven D. Berger, C. J. Biddick et al. · Japanese Journal of Applied Physics · 1995 · 21 citations

Engineering, Electrical Engineering, Electronic Materials +8

Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system

L. R. Harriott, S. D. Berger, C. J. Biddick et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 21 citations

Engineering, Manufacturing Engineering, Materials Engineering +14

EBES4: A new electron-beam exposure system

D. S. Alles, C. J. Biddick, John H. Bruning et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 19 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +14

Negative chemically amplified resist characterization for direct write and SCALPEL nanolithography

Leonidas E. Ocola, C. J. Biddick, D. M. Tennant et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 17 citations

Engineering, Materials Engineering, Materials Science +9